发明名称 |
POLISHING PAD AND METHOD OF MANUFACTURING THE SAME |
摘要 |
Polishing pad and method of manufacturing the same, the method including: (a) mixing materials for forming a polishing layer; (b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores; (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer including the two or more types of pores; and (d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer.
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申请公布号 |
US2013212951(A1) |
申请公布日期 |
2013.08.22 |
申请号 |
US201313761338 |
申请日期 |
2013.02.07 |
申请人 |
KPX CHEMICAL CO., LTD.;SAMSUNG ELECTRONICS CO., LTD.;SAMSUNG ELECTRONICS CO., LTD.;KPX CHEMICAL CO., LTD. |
发明人 |
AHN BONG-SU;JANG YOUNG-JUN;LEE SANG-MOK;CHUNG HWI-KUK;SONG KEE-CHEON;KIM SEUNG-GEUN;SEO JANG-WON;CHOO JEONG-SEON |
分类号 |
B24D3/32 |
主分类号 |
B24D3/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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