发明名称 METHOD FOR PURGING A SUBSTRATE CONTAINER
摘要 A method for purging a substrate container which accommodates in multiple stages a plurality of substrates to be processed by a substrate processing apparatus, the method includes: mounting the substrate container on a mounting unit; connecting a gas supply port provided in the substrate container and a gas supply line provided in a mounting unit; starting supply of a dry gas into the substrate container from a gas supply line before opening a cover of the substrate container; opening the cover of the substrate container while keeping the supply of the dry gas; closing the cover of the substrate container upon completion of processing of the substrates in the substrate container; and stopping the supply of the dry gas after closing the cover of the substrate container.
申请公布号 US2013213442(A1) 申请公布日期 2013.08.22
申请号 US201313757954 申请日期 2013.02.04
申请人 TOKYO ELECTRON LIMITED;TOKYO ELECTRON LIMITED 发明人 KAISE SEIICHI;AMEMIYA SHIGEKI;ONODERA SHINOBU;FUJITA HIROKI;NISHINO MASARU;RIKUKAWA ATSUSHI
分类号 H01L21/677 主分类号 H01L21/677
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