| 摘要 |
<p>Provided is a liquid crystal display manufacturing method which is capable of improving the aperture ratio while suppressing unevenness in the display. This method is for manufacturing a liquid crystal display provided with an array substrate (10) including an insulating layer (16), a source bus line (12) and a pixel electrode (14), wherein the source bus line (12) and pixel electrode (14) are provided on the insulating layer (16), and the source bus line (12) includes a lower layer (12a) and an upper layer (12b) laminated on the lower layer (12a). This manufacturing method includes a first photolithography step for using a first photomask to pattern the first conductor film, and, after the first photolithography step, a second photolithography step for using a second photomask to pattern at least a second conductor film and forming the source bus line (12) and the pixel electrode (14). In the first photolithography step, the first conductor film is removed in at least an opening region without being removed at least in the region where the lower layer (12a) is formed, and the lower layer (12a) and upper layer (12b) are formed from the first conductor film and a second conductor film, respectively.</p> |
