发明名称 Structure and method to fabricate resistor on finfet processes
摘要 A structure comprises first and at least second fin structures are formed. Each of the first and at least second fin structures has a vertically oriented semiconductor body. The vertically oriented semiconductor body is comprised of vertical surfaces. A doped region in each of the first and at least second fin structures is comprised of a concentration of dopant ions present in the semiconductor body to form a first resistor and at least a second resistor, and a pair of merged fins formed on outer portions of the doped regions of the first and at least second fin structures. The pair of merged fins is electrically connected so that the first and at least second resistors are electrically connected in parallel with each other.
申请公布号 GB201312090(D0) 申请公布日期 2013.08.21
申请号 GB20130012090 申请日期 2011.12.21
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人
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