发明名称 PLASMA PROCESSING CHAMBER WITH DUAL AXIAL GAS INJECTION AND EXHAUST
摘要 An electrode is exposed to a plasma generation volume and is defined to transmit radiofrequency power to the plasma generation volume, and includes an upper surface for holding a substrate in exposure to the plasma generation volume. A gas distribution unit is disposed above the plasma generation volume and in a substantially parallel orientation to the electrode. The gas distribution unit includes an arrangement of gas supply ports for directing an input flow of a plasma process gas into the plasma generation volume in a direction substantially perpendicular to the upper surface of the electrode. The gas distribution unit also includes an arrangement of through-holes that each extend through the gas distribution unit to fluidly connect the plasma generation volume to an exhaust region. Each of the through-holes directs an exhaust flow from the plasma generation volume in a direction substantially perpendicular to the upper surface of the electrode.
申请公布号 KR20130093110(A) 申请公布日期 2013.08.21
申请号 KR20137005615 申请日期 2011.06.22
申请人 LAM RESEARCH CORPORATION 发明人 DHINDSA RAJINDER;MARAKHATNOV ALEXEI;BAILEY ANDREW D. III
分类号 H01L21/205;H01L21/3065 主分类号 H01L21/205
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