| 摘要 |
PURPOSE: A substrate processing apparatus is provided to minimize the contact area of a substrate and to uniformly support the whole surface of the substrate at the same time, thereby improving the reliability of a product. CONSTITUTION: A main body(110) includes a chamber(111) for processing a substrate(50). A pair of fixing bars(120) is formed in the chamber. A line type support bar(140) intersects the fixing bar. A support pin is formed in the support bar for mounting the substrate. The sidewall of the main body supports a heater(150). A cooling pipe(160) cools the substrate. |
