发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
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申请公布号 |
US8514365(B2) |
申请公布日期 |
2013.08.20 |
申请号 |
US20070806662 |
申请日期 |
2007.06.01 |
申请人 |
DE JONG FREDERIK EDUARD;BEEMS MARCEL HENDRIKUS MARIA;VAN DEN BRINK MARINUS AART;JACOBS JOHANNES HENRICUS WILHELMUS;LEENDERS MARTINUS HENDRIKUS ANTONIUS;LEVASIER LEON MARTIN;VAN DER MEULEN FRITS;OTTENS JOOST JEROEN;ZAAL KOEN JACOBUS JOHANNES MARIA;DROSTE RICHARD BERNARDUS JOHANNES;DE KLERK JOHANNES WILHELMUS;WANTEN PETER FRANCISCUS;VAN DER HOEVEN JAN CORNELIS;KADIJK EDWIN CORNELIS;DE JONG MARTEIJN;ANSTOTZ DAVID LUCIEN;ASML NETHERLANDS B.V. |
发明人 |
DE JONG FREDERIK EDUARD;BEEMS MARCEL HENDRIKUS MARIA;VAN DEN BRINK MARINUS AART;JACOBS JOHANNES HENRICUS WILHELMUS;LEENDERS MARTINUS HENDRIKUS ANTONIUS;LEVASIER LEON MARTIN;VAN DER MEULEN FRITS;OTTENS JOOST JEROEN;ZAAL KOEN JACOBUS JOHANNES MARIA;DROSTE RICHARD BERNARDUS JOHANNES;DE KLERK JOHANNES WILHELMUS;WANTEN PETER FRANCISCUS;VAN DER HOEVEN JAN CORNELIS;KADIJK EDWIN CORNELIS;DE JONG MARTEIJN;ANSTOTZ DAVID LUCIEN |
分类号 |
G03B27/52;G03B27/32;G03B27/58;G03B27/60;G03B27/68 |
主分类号 |
G03B27/52 |
代理机构 |
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