发明名称 Low-voltage structure for high-voltage electrostatic discharge protection
摘要 An electrostatic discharge (ESD) protected device may include a substrate, an N+ doped buried layer, an N-type well region and a P-type well region. The N+ doped buried layer may be disposed proximate to the substrate. The N-type well region may be disposed proximate to a portion of the N+ doped buried layer to form a collector region. The P-type well region may be disposed proximate to remaining portions of the N+ doped buried layer and having at least a P+ doped plate corresponding to a base region and distributed segments of N+ doped plates corresponding to an emitter region.
申请公布号 US8513774(B2) 申请公布日期 2013.08.20
申请号 US20100899181 申请日期 2010.10.06
申请人 CHEN HSIN-LIANG;CHOR CHAN WING;MACRONIX INTERNATIONAL CO., LTD. 发明人 CHEN HSIN-LIANG;CHOR CHAN WING
分类号 H01L29/00 主分类号 H01L29/00
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