发明名称 |
Low-voltage structure for high-voltage electrostatic discharge protection |
摘要 |
An electrostatic discharge (ESD) protected device may include a substrate, an N+ doped buried layer, an N-type well region and a P-type well region. The N+ doped buried layer may be disposed proximate to the substrate. The N-type well region may be disposed proximate to a portion of the N+ doped buried layer to form a collector region. The P-type well region may be disposed proximate to remaining portions of the N+ doped buried layer and having at least a P+ doped plate corresponding to a base region and distributed segments of N+ doped plates corresponding to an emitter region.
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申请公布号 |
US8513774(B2) |
申请公布日期 |
2013.08.20 |
申请号 |
US20100899181 |
申请日期 |
2010.10.06 |
申请人 |
CHEN HSIN-LIANG;CHOR CHAN WING;MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
CHEN HSIN-LIANG;CHOR CHAN WING |
分类号 |
H01L29/00 |
主分类号 |
H01L29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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