发明名称 Processes and structures for beveled slope integrated circuits for interconnect fabrication
摘要 The present invention discloses methods and apparatuses for the separations of IC fabrication and assembling of separated IC components to form complete IC structures. In an embodiment, the present fabrication separation of an IC structure into multiple discrete components can take advantages of dedicated IC fabrication facilities and achieve more cost effective products. In another embodiment, the present chip assembling provides high density interconnect wires between bond pads, enabling cost-effective assembling of small chip components. In an aspect, the present process provides a beveled slope of the components to facilitate interconnection bonding.
申请公布号 US8513110(B2) 申请公布日期 2013.08.20
申请号 US20090484222 申请日期 2009.06.14
申请人 SHEATS JAYNA 发明人 SHEATS JAYNA
分类号 H01L21/4763 主分类号 H01L21/4763
代理机构 代理人
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