发明名称 ESD field-effect transistor and integrated diffusion resistor
摘要 An electrostatic discharge protection device, methods of fabricating an electrostatic discharge protection device, and design structures for an electrostatic discharge protection device. A drain of a first field-effect transistor and a diffusion resistor of higher electrical resistance may be formed as different portions of a doped region. The diffusion resistor, which is directly coupled with the drain of the first field-effect transistor, may be defined using an isolation region of dielectric material disposed in the doped region and selective silicide formation. The electrostatic discharge protection device may also include a second field-effect transistor having a drain as a portion the doped region that is directly coupled with the diffusion resistor and indirectly coupled by the diffusion resistor with the drain of the first field-effect transistor.
申请公布号 US8513738(B2) 申请公布日期 2013.08.20
申请号 US201113188094 申请日期 2011.07.21
申请人 CAMPI, JR. JOHN B.;CHANG SHUNHUA T.;CHATTY KIRAN V.;GAUTHIER, JR. ROBERT J.;LI JUNJUN;MISHRA RAHUL;MUHAMMAD MUJAHID;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CAMPI, JR. JOHN B.;CHANG SHUNHUA T.;CHATTY KIRAN V.;GAUTHIER, JR. ROBERT J.;LI JUNJUN;MISHRA RAHUL;MUHAMMAD MUJAHID
分类号 H01L23/60 主分类号 H01L23/60
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