发明名称 |
LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY |
摘要 |
A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. |
申请公布号 |
KR20130092485(A) |
申请公布日期 |
2013.08.20 |
申请号 |
KR20130014171 |
申请日期 |
2013.02.07 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
CROUSE MICHAEL MATTHEW;VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA;LIU PENG;LIU HUA YU;JIANG AIQIN;HUANG WENJIN |
分类号 |
G03F7/00;G03F7/20;G03F9/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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