发明名称 Method for manufacturing display device
摘要 According to one embodiment, a method is disclosed for manufacturing a display device. A film material layer is formed on a support substrate. A first heating process for the film material layer at a first temperature to form a film layer and a second heating process for a second region surrounding a first region at a second temperature higher than the first temperature are performed. The first region is provided in a central part of the film layer. A display layer is formed in the first region and a peripheral circuit section is formed at least in a part of the second region. A third heating process is performed for at least a part of the film layer at a third temperature higher than the second temperature. In addition, the film layer is peeled off from the support substrate.
申请公布号 US8513040(B2) 申请公布日期 2013.08.20
申请号 US201213483672 申请日期 2012.05.30
申请人 SAKANO TATSUNORI;MIURA KENTARO;SAITO NOBUYOSHI;NAKANO SHINTARO;UEDA TOMOMASA;YAMAGUCHI HAJIME;KABUSHIKI KAISHA TOSHIBA 发明人 SAKANO TATSUNORI;MIURA KENTARO;SAITO NOBUYOSHI;NAKANO SHINTARO;UEDA TOMOMASA;YAMAGUCHI HAJIME
分类号 H01L21/00 主分类号 H01L21/00
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