发明名称 |
Method for manufacturing display device |
摘要 |
According to one embodiment, a method is disclosed for manufacturing a display device. A film material layer is formed on a support substrate. A first heating process for the film material layer at a first temperature to form a film layer and a second heating process for a second region surrounding a first region at a second temperature higher than the first temperature are performed. The first region is provided in a central part of the film layer. A display layer is formed in the first region and a peripheral circuit section is formed at least in a part of the second region. A third heating process is performed for at least a part of the film layer at a third temperature higher than the second temperature. In addition, the film layer is peeled off from the support substrate.
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申请公布号 |
US8513040(B2) |
申请公布日期 |
2013.08.20 |
申请号 |
US201213483672 |
申请日期 |
2012.05.30 |
申请人 |
SAKANO TATSUNORI;MIURA KENTARO;SAITO NOBUYOSHI;NAKANO SHINTARO;UEDA TOMOMASA;YAMAGUCHI HAJIME;KABUSHIKI KAISHA TOSHIBA |
发明人 |
SAKANO TATSUNORI;MIURA KENTARO;SAITO NOBUYOSHI;NAKANO SHINTARO;UEDA TOMOMASA;YAMAGUCHI HAJIME |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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