SUBSTRATE COATING METHOD AND SLIT COATER APPARATUS USING SAME

摘要

PURPOSE: A substrate coating method and a slit coater apparatus using the same are provided to obtain an excellent viewing angle by using a second chemical solution as a subsidiary chemical solution for obtaining a uniform viewing characteristic. CONSTITUTION: The surface of an object substrate (G) is covered with a first chemical solution (551). An electrode positioned in a cell is covered with a second chemical solution (552). The coating thickness of the first chemical solution is 3-30 μm. The coating thickness of the second chemical solution is 500-5000 μm. The first chemical solution and the second chemical solution are sprayed at the same time.