发明名称 Semiconductor device and method for manufacturing the same
摘要 A first driver transistor includes a first gate insulating film that surrounds a periphery of a first island-shaped semiconductor, a first gate electrode having a first surface that is in contact with the first gate insulating film, and first and second first-conductivity-type high-concentration semiconductors disposed on the top and bottom of the first island-shaped semiconductor, respectively. A first load transistor includes a second gate insulating film having a first surface that is in contact with a second surface of the first gate electrode, a first arcuate semiconductor formed so as to be in contact with a portion of a second surface of the second gate insulating film, and first and second second-conductivity-type high-concentration semiconductors disposed on the top and bottom of the first arcuate semiconductor, respectively. A first gate line extends from the first gate electrode and is made of the same material as the first gate electrode.
申请公布号 US8513717(B2) 申请公布日期 2013.08.20
申请号 US201113328574 申请日期 2011.12.16
申请人 MASUOKA FUJIO;NAKAMURA HIROKI;UNISANTIS ELECTRONICS SINGAPORE PTE. LTD. 发明人 MASUOKA FUJIO;NAKAMURA HIROKI
分类号 H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L29/76
代理机构 代理人
主权项
地址