发明名称 Semiconductor device and method for fabricating the same
摘要 A semiconductor device includes a semiconductor chip having an element formation surface on which at least one element is formed and including a plurality of electrode pads formed on the element formation surface, an interconnect substrate having a principal surface facing the element formation surface of the semiconductor chip and including a plurality of connection pads formed at positions of the principal surface facing the respective corresponding electrode pads, and a plurality of solder bumps provided between the respective corresponding electrode pads and connection pads, and configured to electrically connect the respective corresponding electrode pads and connection pads together. An UBM layer is formed on a portion of each solder bump closer to the corresponding electrode pad and a barrier metal layer is formed on a portion of each solder bump closer to the corresponding connection pad, and the two layers have substantially the same composition of major materials.
申请公布号 US8513818(B2) 申请公布日期 2013.08.20
申请号 US201113038950 申请日期 2011.03.02
申请人 HAGIHARA KIYOMI;PANASONIC CORPORATION 发明人 HAGIHARA KIYOMI
分类号 H01L23/52;H01L23/48;H01L29/40 主分类号 H01L23/52
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