发明名称 |
Methods of modifying oxide spacers |
摘要 |
Methods for reducing line roughness of spacers and other features utilizing a non-plasma and non-wet etch fluoride processing technology are provided. Embodiments of the methods can be used for spacer or line reduction and/or smoothing the surfaces along the edges of such features through the reaction and subsequent removal of material.
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申请公布号 |
US8513135(B2) |
申请公布日期 |
2013.08.20 |
申请号 |
US201113246050 |
申请日期 |
2011.09.27 |
申请人 |
GREELEY JOSEPH NEIL;MORGAN PAUL;KIEHLBAUCH MARK;MICRON TECHNOLOGY, INC. |
发明人 |
GREELEY JOSEPH NEIL;MORGAN PAUL;KIEHLBAUCH MARK |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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