发明名称 Hybrid silicon wafer
摘要 A hybrid silicon wafer which is a silicon wafer having a structure wherein the main plane orientation of polycrystalline silicon that is prepared by a unidirectional solidification/melting method is (311), and monocrystalline silicon is embedded in the polycrystalline silicon. The hybrid silicon wafer according to any one of claims 1 to 6, wherein the purity of the polycrystalline silicon portion excluding gas components is 6N or higher, the total amount of metal impurities is 1 wtppm or less, and, among the metal impurities, Cu, Fe, Ni, and Al are respectively 0.1 wtppm or less. Thus, a hybrid silicon wafer having the functions of both a polycrystalline silicon wafer and a monocrystalline silicon wafer is provided and the occurrence of polish bumps and macro-sized unevenness between the polycrystalline silicon and the monocrystalline silicon are prevented.
申请公布号 US8512868(B2) 申请公布日期 2013.08.20
申请号 US201013499304 申请日期 2010.10.28
申请人 SUZUKI RYO;TAKAMURA HIROSHI;JX NIPPON MINING & METALS CORPORATION 发明人 SUZUKI RYO;TAKAMURA HIROSHI
分类号 B32B9/04;B32B13/04;C01B33/02 主分类号 B32B9/04
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