| 摘要 |
<p>PURPOSE: A substrate processing scrubber, a substrate processing device and a substrate processing method are provided to eliminate a target object from a substrate by restricting a scrubber main body from being inclined by reaction force from the substrate. CONSTITUTION: A substrate processing scrubber (29) eliminates a target object from a substrate. The substrate processing scrubber has a base frame (31) connected to a rotary shaft (28), a scrubber main body (32) and a processing liquid supplying part (36). The scrubber main body are plurally installed having intervals in a rotating direction. The processing liquid supplying part supplies processing liquid to the scrubber main body. The scrubber main body forms the area of a mounting surface with the base frame larger than the area contacting the surface of the substrate.</p> |
