| 摘要 |
PURPOSE: A plating device including stirrers is provided to enhance the plating process efficiency by enhancing the agitation efficiency of plating solution. CONSTITUTION: A plating device including stirrers comprises a plating process unit(20) and a plating solution stirring unit(10). The plating process unit performs the plating process. The plating solution stirring unit agitates the plating solution(101) and supplies the agitated plating solution to the plating processing unit. The plating solution agitating unit comprises a storage vessel(110), a plating solution feeding line(150), a rotary shaft(130), and an impeller structure(140). The storage vessel stores the plating solution. The plating solution feeding line supplies the plating solution from the storage vessel to the plating process unit. |
