发明名称 METHOD FOR CONTROLLING SLURRY SUPPLY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for controlling a slurry supply device capable of reducing the abrasion of a diaphragm valve.SOLUTION: A slurry supply device 1 includes: piping 20 connecting a slurry supply source D and a slurry supplying destination F; a pump 30 interposed in the piping 20; and a diaphragm valve 21 interposed on the discharge side of the pump 30 of the piping 20. In this method for controlling the slurry supply device 1, the pump 30 is controlled such that the flow rate during the opening/closing changeover operation of the diaphragm valve 21 becomes small compared to the flow rate when the diaphragm valve 21 is in an opened state. Because the flow rate of slurry during the opening/closing changeover operation of the diaphragm valve 21 is small, the abrasion of the diaphragm valve 21 can be reduced.
申请公布号 JP2013158665(A) 申请公布日期 2013.08.19
申请号 JP20120020499 申请日期 2012.02.02
申请人 SUMITOMO METAL MINING CO LTD 发明人 SUGA TAKAMASA
分类号 C02F11/00 主分类号 C02F11/00
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