发明名称 THIN FILM TRANSISTOR, MANUFACTURING METHOD OF THIN FILM TRANSISTOR AND DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor having a channel structure compatible with a large ON-state current and a small OFF-state current.SOLUTION: A thin film transistor (100) includes: a substrate (10); a gate electrode (12); a gate insulating layer (13); a first silicon layer (16) formed over the gate insulating layer (13) in a central area in a length direction of the gate above the gate electrode (12); a pair of second silicon layers (15) formed in both sides of the first silicon layer (16) over the gate insulating layer (13) above both sides of the gate electrode (12) in the length direction of the gate; and a pair of source and drain electrodes (19). The first silicon layer (16) is thicker than the second silicon layers (15). The first silicon layer (16) is constituted of crystalline silicon. The second silicon layers (15) are constituted of crystalline silicon or amorphous silicon, average grain size thereof is smaller than that in the first silicon layer (16).
申请公布号 JP2013161963(A) 申请公布日期 2013.08.19
申请号 JP20120023089 申请日期 2012.02.06
申请人 PANASONIC CORP 发明人 MATSUMOTO MITSUMASA;KAWASHIMA TAKAHIRO
分类号 H01L21/336;G02F1/1368;H01L21/20;H01L29/786 主分类号 H01L21/336
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