| 摘要 |
PURPOSE: A method for manufacturing an indium tin oxide target with improved productivity is provided to reduce nodules produced on a target during a sputtering process by using a sintered body of indium tin oxide with improved uniformity and dispersibility. CONSTITUTION: A method for manufacturing an indium tin oxide target comprises the steps of: preparing indium tin oxide powder through plasma pyrolysis of a tine precursor solution or tine powder, mixing tine oxide powder with indium oxide powder to prepare slurry, milling and drying the slurry to prepare granule powder, molding the granular powder to obtain a molded body, sintering the molded body. [Reference numerals] (AA) Preparing indium tin oxide powder; (BB) Preparing slurry; (CC) Granulizing; (DD) Making molded body; (EE) Making sintered body |
