| 摘要 |
PURPOSE: A substrate processing apparatus and a substrate carrying-in method are provided to prepare a vacuum pump for each of a first load lock chamber and a second load lock chamber, thereby forming vacuum levels differently. CONSTITUTION: A substrate is processed at a process module. A load lock module carries the substrate into the process module. The load lock module includes a first load lock chamber (200) and a second load lock chamber (300). The first load lock chamber is equipped with an inlet at one side. The second load lock chamber is equipped with an outlet at one side. The substrate is successively conveyed through the first load lock chamber, the second load lock chamber, and the process module. |
