| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate quality evaluation method which enables quick quality evaluation in an ELA process matched with quality evaluation values by a visual inspector or with final picture quality, and an apparatus therefor. SOLUTION: A substrate 5 to be evaluated is moved continuously in one direction while light is impinged on the substrate 5 from an oblique direction, whereby an image based on a primary diffracted light, which is produced by a polycrystalline silicon thin film formed on the substrate 5, is photographed to obtain a primary diffracted light image. Also, an image of scattered light near the optical axis of regular reflected light or transmitted light from the substrate 5 is photographed to obtain a scattered light image near the optical axis. The primary diffracted light image and the scattered light image near the optical axis thus obtained are processed to extract plural features, and at lease one or more of the extracted plural features are used to calculate a quality evaluation value of the polycrystalline silicon thin film formed on the substrate 5 according to preset evaluation standards, to evaluate the quality of the polycrystalline silicon thin film formed on the substrate 5. COPYRIGHT: (C)2012,JPO&INPIT |
