SURFACE MEASUREMENT DEVICE

摘要

The following points have not been taken into account in related art pertaining to surface measurement and defect inspection: (1) the roughness of space frequency notches; (2) a change in a detection signal which is caused by microroughness anisotropy; and (3) a change in a background signal which is caused by the microroughness anisotropy. The present invention is characterized by obtaining a feature quantity relating to the microroughness anisotropy of a substrate surface. Additionally, the present invention is characterized by obtaining a surface state, taking into account the microroughness anisotropy of the substrate surface. The present invention is further characterized by detecting defects in the surface, taking into account the microroughness anisotropy of the substrate surface.