发明名称 |
FILM FORMATION DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a film formation device which prevents particles from adhering to a work-piece even if the particles occur in dispersion nozzles etc.SOLUTION: A film formation device forming a thin film on a surface of a work-piece W includes: a processing container 4; holding means 12 for holding multiple work-pieces between a top plate 13A and a bottom plate 13B; heating means 94 for heating the work-piece; material gas supply means 30 having a dispersion nozzle 40 where multiple gas jet holes 30A are formed; reaction gas supply means 28 having a dispersion nozzle 38 where multiple gas jet holes 38A are formed; and a device control part 96 controlling the operation of the entire apparatus. A particle emission hole 60 is provided at an upper part of at least one of the dispersion nozzles which is located at a higher position than a work-piece holding region 15 of the holding means. |
申请公布号 |
JP2013157491(A) |
申请公布日期 |
2013.08.15 |
申请号 |
JP20120017528 |
申请日期 |
2012.01.31 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
TONEGAWA YAMATO;SUZUKI KEISUKE;OZAKI TETSUSHI;MOROZUMI YUICHIRO;CHANG DE QING |
分类号 |
H01L21/31;C23C16/44;C23C16/455 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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