发明名称 SEMICONDUCTOR SENSOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To increase the pressure detection sensitivity by reducing the size of a semiconductor pressure sensor.SOLUTION: A deep groove is formed in a thickness direction of a semiconductor substrate. When pressure is applied to a groove adjacent to the groove with part of the groove airtight, a barrier (corresponding to a diaphragm) between the grooves bends, causing the capacity of an airtight space or a groove part to change. By detecting the amount of the change, pressure can be detected. Deepening the groove causes the capacity to increase, thereby allowing a sensor having a smaller area to be created. Furthermore, thinning the barrier allows the amount of change in the barrier to increase, thereby improving the sensor sensitivity.
申请公布号 JP2013156102(A) 申请公布日期 2013.08.15
申请号 JP20120016017 申请日期 2012.01.30
申请人 HOSAKA SHUN 发明人 HOSAKA SHUN
分类号 G01L9/00;B41J2/045;B41J2/055;H01L29/84;H01L41/08;H01L41/09;H01L41/18;H01L41/187;H01L41/193;H01L41/22;H01L41/39;H04R19/04;H04R31/00 主分类号 G01L9/00
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