发明名称 DIMENSIONAL SILICA-BASED POROUS SILICON STRUCTURES AND METHODS OF FABRICATION
摘要 Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.
申请公布号 US2013209781(A1) 申请公布日期 2013.08.15
申请号 US201313847740 申请日期 2013.03.20
申请人 BELLMAN ROBERT ALAN;BORRELLI NICHOLAS FRANCIS;DENEKA DAVID ALAN;O'MALLEY SHAWN MICHAEL;SCHNEIDER VITOR MARINO 发明人 BELLMAN ROBERT ALAN;BORRELLI NICHOLAS FRANCIS;DENEKA DAVID ALAN;O'MALLEY SHAWN MICHAEL;SCHNEIDER VITOR MARINO
分类号 C03C23/00;H01L21/322 主分类号 C03C23/00
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