发明名称 PRE-CUT WAFER APPLIED UNDERFILL FILM
摘要 A method for preparing a semiconductor with preapplied underfill comprises providing a semiconductor wafer with a plurality of metallic bumps on its top side and, optionally, through-silica-vias vertically through the silicon wafer; laminating a back grinding tape to the top of the wafer covering the metallic bumps and through silicon vias; thinning the back side of the wafer; mounting a dicing tape to the back side of the thinned wafer and mounting the silicon wafer and dicing tape to a dicing frame; removing the back grinding tape; providing an underfill material precut into the shape of the wafer; aligning the underfill on with the wafer and laminating the underfill to the wafer.
申请公布号 US2013210239(A1) 申请公布日期 2013.08.15
申请号 US201313800862 申请日期 2013.03.13
申请人 HENKEL CORPORATION;HENKEL CORPORATION 发明人 KIM YOUNSANG;HOANG GINA;GUINO ROSE
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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