THIN FILM DEPOSITION METHOD, THIN FILM DEPOSITION APPARATUS, ELECTROMECHANICAL CONVERSION ELEMENT, LIQUID DISCHARGE HEAD AND INK JET RECORDING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a thin film deposition method, a thin film deposition apparatus, an electromechanical conversion element, a liquid discharge head and an ink jet recording device, which have high reliability and which can rapidly form an electromechanical conversion film.SOLUTION: A thin film deposition method comprises the steps of: immersing a substrate 30 in a precursor solution 90 of an electromechanical conversion film; causing laser beams 60e to enter an electrode layer 15 at a total reflection critical angle in the precursor solution 90 to form on the electrode layer 15, an electromechanical conversion film 10 which is turned from the precursor solution 90; evaluating a crystalline state of the electromechanical conversion film 10 by an X-ray diffractometer 80; and changing an irradiation condition of the laser beams 60e when an evaluation value obtained by the evaluation is outside a target value and irradiating a boundary surface between the electrode layer 15 and the electromechanical conversion film 10 with the laser beams 60e in which the irradiation condition has been changed.