发明名称 METHOD OF GENERATING EXPOSURE UNEVENNESS CORRECTION TABLE, LIGHT EMITTING DEVICE FOR EXPOSURE, AND IMAGE FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a technology for accurately correcting the light quantity of light emitting elements while suppressing a memory from increasing.SOLUTION: A method of generating a correction table for correcting exposure unevenness caused by variation in the light quantity among a plurality of light emitting elements, includes: a step (S10) of setting a correction range for correcting a parameter value of driving signals which light each light emitting element so that each light emitting element can obtain the target exposure light quantity by correcting the light quantity of each light emitting element; a step (S20) of setting a first reference value of the parameter value in the set correction range; a step (S30) of setting the correction sectioning number to be applied to a group of light emitting elements with the exposure light quantity larger than the target exposure light quantity when lighting each light emitting element using the first reference value to be the correction sectioning number or more to be applied to a group of light emitting elements with the exposure light quantity smaller than the target exposure light quantity; and a step (S50) of generating the correction table by associating the correction amount of the parameter value with each set correction section.
申请公布号 JP2013154542(A) 申请公布日期 2013.08.15
申请号 JP20120016963 申请日期 2012.01.30
申请人 BROTHER INDUSTRIES LTD 发明人 MATSUURA TAIZO
分类号 B41J2/455;B41J2/44;B41J2/45;H04N1/036 主分类号 B41J2/455
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