发明名称 METHOD FOR ETCHING LCD GLASS SUBSTRATE AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To solve in etching an LCD glass substrate the problem that because the flow of an etchant is disturbed by the substrate contact part in an etching basket, etching unevenness or jig mark unevenness arises and the problem that variation in the thicknesses of the glass substrates after etching arises when bubbles emerging from a bubbler become unstable.SOLUTION: A method for etching LCD glass substrates is characterized by arranging the glass substrates in parallel in an etching basket placed in an etching tank containing an etchant and etching the glass substrates while gently shaking them by bubbles released from the lower part of the etching basket.
申请公布号 JP2013155057(A) 申请公布日期 2013.08.15
申请号 JP20120014598 申请日期 2012.01.26
申请人 SANWA FROST INDUSTRY CO LTD 发明人 TAKIZAWA ATSUSHI;AKIBA HIROYUKI;YOSHIDA NORIYOSHI;NIKAMI YUICHI;HOSHINO MITSUYUKI;IMAI SATORU
分类号 C03C15/00;G02F1/13;G02F1/1333 主分类号 C03C15/00
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