发明名称 CHARGED PARTICLE DRAWING SYSTEM AND PARAMETER MONITORING METHOD OF CHARGED PARTICLE DRAWING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a drawing system in which parameter management is possible.SOLUTION: A drawing system 100 includes control units 122, 124, 126 of different protocols, a drawing device 110 which draws a pattern on a sample by using an electron beam 200, a database 140 which stores parameter information received from an external slave computer, an interface circuit group 139 which outputs the parameter information thus received to the control units 122, 124, 126 according to the protocols, a master computer 160, and an I/F circuit group 170 which receives a request from the master computer 160 and transmits the parameter information, set in the control units 122, 124, 126 without going through the database 140, while converting to conform with a protocol used by the master computer 160. According to the invention, drawing not assumed can be avoided.
申请公布号 JP2013157637(A) 申请公布日期 2013.08.15
申请号 JP20130098240 申请日期 2013.05.08
申请人 NUFLARE TECHNOLOGY INC 发明人 GOTO YOSHIKUNI
分类号 H01L21/027;G03F7/20;H01J37/305 主分类号 H01L21/027
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