发明名称 GAS SUPPLY DEVICE
摘要 A gas supply device (11) which provides a tank (21) that stores LNG (12) with a supply path (31) for supplying vaporized gas to gas-consuming equipment (13) and with a return path (41) for returning vaporized gas that has been conducted out from an internal thermally insulated chamber (25), and which supplies gas through the supply path (31) by adjusting the pressure inside the tank (21) using a pressure-adjusting means (42) provided in the return path (41). The internal thermally insulated chamber (25), which is partitioned off by a liquid gas-storing section (24) for storing the LNG (12) and a vacuum insulation layer (22a), is provided inside the tank (21). In the liquid gas-storing section (24), a conducting path (26) for conducting the LNG to the internal thermally insulated chamber (25) is formed. The upstream portion of the return path (41) is formed inside the tank (21). In the internal thermally insulated chamber (25), a heat-exchanging section (27) that uses the gas as the heating medium is provided for vaporizing the LNG (12) and the liquid phase portion is stored in the tank (21).
申请公布号 WO2013118756(A1) 申请公布日期 2013.08.15
申请号 WO2013JP52694 申请日期 2013.02.06
申请人 IWATANI CORPORATION;A-TEC CO., LTD.;MITSUBISHI HEAVY INDUSTRIES, LTD. 发明人 KUSAKA HIROYUKI;TAKATA TAKAYOSHI;TAKAO KAZUHIRO;GOTO KATSUHIKO;SHIBUYA TOSHIKI;YAMADA DAISUKE
分类号 F17C13/00;B63B25/16;F17C7/04 主分类号 F17C13/00
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