| 摘要 |
When this reflective image-forming optical system is applied to, for instance, an exposure apparatus using EUV light, this system is capable of suppressing a footprint of the apparatus. The reflective image-forming optical system which forms, on a second surface, an image of a pattern disposed on a first surface illuminated with light emitted from an illuminating optical system is provided with a plurality of reflecting mirrors including a first reflecting mirror, which firstly reflects light that has been reflected by the first surface, and a second reflecting mirror, which secondly reflects the light that has been reflected by the first surface. When a region where the first surface is irradiated with the light emitted from the illuminating optical system is specified as a region to be irradiated, and a portion where the region to be irradiated is positioned on the first surface is on the side further toward the predetermined direction than optical axes of the reflecting mirrors, a reflection region of the first reflecting mirror and a reflection region of the second reflecting mirror are positioned on the side further toward the predetermined direction than the optical axes of the reflecting mirrors, and the first reflecting mirror and the second reflecting mirror are disposed to sandwich an optical path of the light emitted from the illuminating optical system. |
