发明名称 LOW DIELECTRIC PHOTOIMAGEABLE COMPOSITIONS AND ELECTRONIC DEVICES MADE THEREFROM
摘要 This invention relates generally to silicon based photoresist compositions that can be used in forming low k dielectric constant materials suitable for use in electronic devices, methods of their use and the electronic devices made therefrom.
申请公布号 US2013209754(A1) 申请公布日期 2013.08.15
申请号 US201213369809 申请日期 2012.02.09
申请人 ZHANG RUZHI;KIM JIHOON;PATEL BHARATKUMAR K.;WOLFER ELIZABETH;AZ ELECTRONIC MATERIALS USA CORP. 发明人 ZHANG RUZHI;KIM JIHOON;PATEL BHARATKUMAR K.;WOLFER ELIZABETH
分类号 G03F7/20;B32B3/10;G03F7/004 主分类号 G03F7/20
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