发明名称 |
LOW DIELECTRIC PHOTOIMAGEABLE COMPOSITIONS AND ELECTRONIC DEVICES MADE THEREFROM |
摘要 |
This invention relates generally to silicon based photoresist compositions that can be used in forming low k dielectric constant materials suitable for use in electronic devices, methods of their use and the electronic devices made therefrom. |
申请公布号 |
US2013209754(A1) |
申请公布日期 |
2013.08.15 |
申请号 |
US201213369809 |
申请日期 |
2012.02.09 |
申请人 |
ZHANG RUZHI;KIM JIHOON;PATEL BHARATKUMAR K.;WOLFER ELIZABETH;AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
ZHANG RUZHI;KIM JIHOON;PATEL BHARATKUMAR K.;WOLFER ELIZABETH |
分类号 |
G03F7/20;B32B3/10;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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