发明名称 |
PATTERN EVALUATION METHOD AND PATTERN EVALUATION DEVICE |
摘要 |
Provided is a pattern evaluation method, comprising: a step of estimating an allowed image capture misalignment for evaluating an overlap location in one or a plurality of evaluation point candidates on the basis of layout information of a pattern; a step of establishing one or a plurality of evaluation points from among the evaluation point candidates on the basis of the allowed image capture misalignment; a step of establishing an image capture sequence for image capturing the selected evaluation points; and a step of evaluating the overlap location of a first pattern and a second pattern from an image which is obtained by image capturing the evaluation points according to the image capture sequence. |
申请公布号 |
WO2013118613(A1) |
申请公布日期 |
2013.08.15 |
申请号 |
WO2013JP51945 |
申请日期 |
2013.01.30 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
MIYAMOTO, ATSUSHI;OSAKI, MAYUKA;KIMURA, MAKI;SHISHIDO, CHIE |
分类号 |
G01B15/04;H01J37/22;H01L21/027;H01L21/66 |
主分类号 |
G01B15/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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