发明名称 PATTERN EVALUATION METHOD AND PATTERN EVALUATION DEVICE
摘要 Provided is a pattern evaluation method, comprising: a step of estimating an allowed image capture misalignment for evaluating an overlap location in one or a plurality of evaluation point candidates on the basis of layout information of a pattern; a step of establishing one or a plurality of evaluation points from among the evaluation point candidates on the basis of the allowed image capture misalignment; a step of establishing an image capture sequence for image capturing the selected evaluation points; and a step of evaluating the overlap location of a first pattern and a second pattern from an image which is obtained by image capturing the evaluation points according to the image capture sequence.
申请公布号 WO2013118613(A1) 申请公布日期 2013.08.15
申请号 WO2013JP51945 申请日期 2013.01.30
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 MIYAMOTO, ATSUSHI;OSAKI, MAYUKA;KIMURA, MAKI;SHISHIDO, CHIE
分类号 G01B15/04;H01J37/22;H01L21/027;H01L21/66 主分类号 G01B15/04
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