SUBSTRATE HOLDING DEVICE, POLISHING APPARATUS AND POLISHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate holding device which can prevent foreign objects such as abrasion powder from falling onto a polished surface and allows a retainer ring to evenly apply a desired pressing force to the polished surface.SOLUTION: A substrate holding device comprises: an inner retainer ring 20 which is vertically movable independently of a top ring body 10 and is arranged to surround a substrate; an inner pressing mechanism 60 which presses the inner retainer ring 20 against a polished surface; an outer retainer ring 30 which is vertically movable independently of the inner retainer ring and the top ring body 10; an outer pressing mechanism 80 which presses the outer retainer ring 30 against the polished surface; and a support mechanism 111 which receives lateral force applied from the substrate to the inner retainer ring 20 during polishing of the substrate.