发明名称 COMPOUND SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To solve a problem of a large influence on practical use of an element substrate such as SiC for a high-voltage driver element, which is caused by a large number of crystal faults and a large amount of leakage current.SOLUTION: In a compound semiconductor of a present embodiment, by forming a single-crystal compound semiconductor such as a SiC film on an insulation film on a substrate to form a Schottky diode as an element substrate, an electric field from the substrate, and an electric field from a conductor formed in a groove which is formed as a trench in a part of the single-crystal semiconductor and which has oxide films on side walls, and an electric field from a field plate provided in a surface layer of the element through an insulation film ease an electric field applied to an anode of the Schottky diode. Accordingly, an influence of a crystal fault of the single-crystal compound semiconductor such as SiC is decreased.
申请公布号 JP2013157587(A) 申请公布日期 2013.08.15
申请号 JP20120029936 申请日期 2012.01.28
申请人 MTEC:KK 发明人 KATO MITSUHARU
分类号 H01L29/47;H01L21/02;H01L27/12;H01L29/41;H01L29/872 主分类号 H01L29/47
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