发明名称 |
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS |
摘要 |
A polymer comprising recurring units having an acid-eliminatable group on a side chain and aromatic ring-bearing cyclic olefin units is used to formulate a chemically amplified negative resist composition. Any size shift between the irradiated pattern and the formed resist which can arise in forming a pattern including isolated feature and isolated space portions is reduced, and a high resolution is obtained.
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申请公布号 |
US2013209922(A1) |
申请公布日期 |
2013.08.15 |
申请号 |
US201213371999 |
申请日期 |
2012.02.13 |
申请人 |
MASUNAGA KEIICHI;WATANABE SATOSHI;KAWAI YOSHIO;BOZANO LUISA;SOORIYAKUMARAN RATNAM |
发明人 |
MASUNAGA KEIICHI;WATANABE SATOSHI;KAWAI YOSHIO;BOZANO LUISA;SOORIYAKUMARAN RATNAM |
分类号 |
G03F1/76;G03F1/50;G03F1/78;G03F7/004 |
主分类号 |
G03F1/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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