SURFACE TREATMENT DEVICE AND METHOD

摘要

A surface treatment device for depositing defined particles on a substrate. The device comprises a first mixing space (150), and a source unit (100) for inputting into the first mixing space (150) atomised droplets of a liquid substance carrying one or more precursors of the defined particles. Liquid substance of the droplets is evaporated within the first mixing space (150) for outputting an aerosol flow carrying precursors of the defined particles from the first mixing space (150). Spatial uniformity of the resulting surface treatment is significantly improved.