发明名称 Semiconductor Device Manufacturing Methods
摘要 Methods of manufacturing semiconductor devices are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes providing a workpiece, and forming a protective material over a bottom surface and edges of the workpiece. A top surface of the workpiece is processed. The protective material protects the edges and the bottom surface of the workpiece during the processing of the top surface of the workpiece.
申请公布号 US2013210212(A1) 申请公布日期 2013.08.15
申请号 US201213396515 申请日期 2012.02.14
申请人 WENG CHIH-HUI;YUN WEI-SHENG;YU SHAO-MING;CHEN HSIN-CHIH;KO CHIH-HSIN;WANN CLEMENT HSINGJEN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 WENG CHIH-HUI;YUN WEI-SHENG;YU SHAO-MING;CHEN HSIN-CHIH;KO CHIH-HSIN;WANN CLEMENT HSINGJEN
分类号 H01L21/02;H01L21/20 主分类号 H01L21/02
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