发明名称 |
MEGASONIC CLEANING USING SUPERSATURATED CLEANING SOLUTION |
摘要 |
<p>A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.</p> |
申请公布号 |
EP1631396(A4) |
申请公布日期 |
2013.08.14 |
申请号 |
EP20040776442 |
申请日期 |
2004.06.10 |
申请人 |
AKRION TECHNOLOGIES, INC. |
发明人 |
FRANKLIN, COLE, S.;WU, YI;FRASER, BRIAN |
分类号 |
B08B3/12;B08B3/00;B08B6/00;B08B7/04;H01L;H01L21/67 |
主分类号 |
B08B3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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