发明名称 |
MANUFACTURING METHOD FOR TRANSPARENT CONDUCTIVE CARBON FILM, AND TRANSPARENT CONDUCTIVE CARBON FILM |
摘要 |
<p>An object of the present invention is to solve problems such as high temperature processing and long processing time, which are issues of formation of a graphene film by thermal CVD, thereby providing a technique of forming a transparent conductive carbon film using a crystalline carbon film formed at lower temperature within a short time using a graphene film, and the method of the present invention is characterized by setting the temperature of a base material to 500°C or lower and the pressure to 50 Pa or less, and also depositing a transparent conductive carbon film on a surface of a base material by a microwave surface-wave plasma CVD method in a gas atmosphere in which an oxidation inhibitor as an additive gas for suppressing oxidation of the surface of the base material is added to a carbon-containing gas or a mixed gas of a carbon-containing gas and an inert gas.</p> |
申请公布号 |
EP2548995(A4) |
申请公布日期 |
2013.08.14 |
申请号 |
EP20110756381 |
申请日期 |
2011.03.17 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY |
发明人 |
KIM JAEHO;ISHIHARA MASATOU;KOGA YOSHINORI;TSUGAWA KAZUO;HASEGAWA MASATAKA;IIJIMA SUMIO;YAMADA TAKATOSHI |
分类号 |
C23C16/26;C23C16/511;C23C16/54;H01B13/00 |
主分类号 |
C23C16/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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