发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 <p>PURPOSE: An apparatus and method for processing a substrate are provided to prevent a misalignment by installing a fixing pin on the peripheral part of a stage. CONSTITUTION: A stage (11) loads a target substrate. A plurality of support pins (16) are installed around the stage to move up and down. The support pins protrude to the upper side of the stage and support the peripheral part of the target substrate. A support pin lifting device (17) lifts the support pins.</p>
申请公布号 KR20130090829(A) 申请公布日期 2013.08.14
申请号 KR20130012755 申请日期 2013.02.05
申请人 TOKYO ELECTRON LIMITED 发明人 UEDA TOSHIHIKO;FURUIE TAKAHIRO
分类号 H01L21/027 主分类号 H01L21/027
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