| 摘要 |
PURPOSE: A plasma processing apparatus and method are provided to efficiently generate plasma using a plasma source discharged several times. CONSTITUTION: A first plasma chamber(110) has a first plasma discharge space. The first plasma source supplies first activation energy to a plasma discharge space within the first plasma chamber. A second plasma chamber(120) is connected to a first plasma chamber in order to have a second plasma discharge space. The second plasma source supplies second activation energy to the plasma discharge space within the second plasma chamber. A third plasma source supplies third activation energy to the plasma discharge space within the second plasma chamber. [Reference numerals] (200) Gas supply source |
