发明名称 Tunnel field effect transistor
摘要 <p>A tunnel field effect transistor (TFET) and a method of making the same. The transistor includes a semiconductor substrate (42). The transistor also includes a gate (50) located on a major surface of the substrate (42). The transistor further includes a drain (46) of a first conductivity type. The transistor also includes a source (44) of a second conductivity type extending beneath the gate (50). The source (44) is separated from the gate (50) by a channel region (62) and a gate dielectric (20). The transistor is operable to allow charge carrier tunnelling from an inversion layer through an upper surface of the source (44).</p>
申请公布号 EP2439777(B1) 申请公布日期 2013.08.14
申请号 EP20100187157 申请日期 2010.10.11
申请人 NXP B.V. 发明人 CURATOLA, GILBERTO;GOLUBOVIC, DUSAN;DONKERS, JOHAN;BOCCARDI, GUILLAUME;MERTENS, HANS
分类号 H01L29/739;H01L21/329 主分类号 H01L29/739
代理机构 代理人
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