<p>A tunnel field effect transistor (TFET) and a method of making the same. The transistor includes a semiconductor substrate (42). The transistor also includes a gate (50) located on a major surface of the substrate (42). The transistor further includes a drain (46) of a first conductivity type. The transistor also includes a source (44) of a second conductivity type extending beneath the gate (50). The source (44) is separated from the gate (50) by a channel region (62) and a gate dielectric (20). The transistor is operable to allow charge carrier tunnelling from an inversion layer through an upper surface of the source (44).</p>
申请公布号
EP2439777(B1)
申请公布日期
2013.08.14
申请号
EP20100187157
申请日期
2010.10.11
申请人
NXP B.V.
发明人
CURATOLA, GILBERTO;GOLUBOVIC, DUSAN;DONKERS, JOHAN;BOCCARDI, GUILLAUME;MERTENS, HANS