发明名称 Apparatus And Method of Fabricating Thin Film Pattern
摘要 An apparatus and a method for manufacturing a thin film pattern are provided to reduce the complexity of a manufacturing process by performing a patterning process without using a photolithography process. A bracket(250) includes a soft mold having a groove and a protrusion unit except the groove. A roll shaped printing roller(200) is wound with the bracket. An apparatus applies an etch resist solution(266a) on a substrate(262) on which a thin film(264a) is formed. An electromagnet(280) is located at a side of the substrate. A magnetic substance(260) is fixed on the bracket. The magnetic substance is detachable with the electromagnet by the magnetic field. The bracket includes an elastic plate, a mold supporting plate, and the soft mold. The elastic plate is directly connected to the printing roller. The mold supporting plate is adhered to the elastic plate by using an adhesive agent. The soft mold is attached to the mold supporting plate by the adhesive agent.
申请公布号 KR101296638(B1) 申请公布日期 2013.08.14
申请号 KR20060123764 申请日期 2006.12.07
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址