发明名称 |
Isolation structures for global shutter imager pixel, methods of manufacture and design structures |
摘要 |
Pixel sensor cells, e.g., CMOS optical imagers, methods of manufacturing and design structures are provided with isolation structures that prevent carrier drift to diffusion regions. The pixel sensor cell includes a photosensitive region and a gate adjacent to the photosensitive region. The pixel sensor cell further includes a diffusion region adjacent to the gate. The pixel sensor cell further includes an isolation region located below a channel region of the gate and about the photosensitive region, which prevents electrons collected in the photosensitive region to drift to the diffusion region.
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申请公布号 |
US8507962(B2) |
申请公布日期 |
2013.08.13 |
申请号 |
US20100897230 |
申请日期 |
2010.10.04 |
申请人 |
ANDERSON BRENT A.;JAFFE MARK D.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ANDERSON BRENT A.;JAFFE MARK D. |
分类号 |
H01L31/062 |
主分类号 |
H01L31/062 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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