发明名称 Silicon carbide substrate, semiconductor device, and SOI wafer
摘要 Disclosed is a silicon carbide substrate which has less high frequency loss and excellent heat dissipating characteristics. The silicon carbide substrate (S) is provided with a first silicon carbide layer (1), which is composed of a polycrystalline silicon carbide, and a second silicon carbide layer (2), which is composed of polycrystalline silicon carbide formed on the surface of the first silicon carbide layer. The second silicon carbide layer (2) has a high-frequency loss smaller than that of the first silicon carbide layer (1), the first silicon carbide layer (1) has a thermal conductivity higher than that of the second silicon carbide layer (2), and on the surface side of the second silicon carbide layer (2), the high-frequency loss at a frequency of 20 GHz is 2 dB/mm or less, and the thermal conductivity is 200 W/mK or more.
申请公布号 US8507922(B2) 申请公布日期 2013.08.13
申请号 US201113808556 申请日期 2011.07.05
申请人 KAWAMOTO SATOSHI;NAKAMURA MASAKI;MITSUI ENGINEERING & SHIPBUILDING CO., LTD.;ADMAP INC. 发明人 KAWAMOTO SATOSHI;NAKAMURA MASAKI
分类号 H01L31/0312 主分类号 H01L31/0312
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